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PECVD Laboratory Tube Furnace 304 Stainless Steel Sealing Flange With Gas Delivery

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PECVD Laboratory Tube Furnace 304 Stainless Steel Sealing Flange With Gas Delivery

Brand Name : Brother Furnace

Model Number : BR-PECVD

Certification : CE

Place of Origin : China

MOQ : 1 Set

Price : Negotiation

Payment Terms : L/C, T/T, Western Union

Supply Ability : 200 Sets per month

Delivery Time : 7-21 Working days

Packaging Details : Strong wooden box for global shipping

Max Temperature : 1200℃

Normal vacuum : -0.1MPa

Max Vacuum : Configuration molecular pump, Vacuum 7x10-4 Pa (Optional)

Flange : 304 stainless steel sealing flange

Over-temperature protection : automatic power-off when the temperature exceeds the allowable set value

Safety protection : Automatically power off when the furnace body leaks

Furnace structure : double layer steel dual cooling fan, surface temperature below 50℃

Max Heating rate : 20°C /min

TEMPERATURE ACCURACY : ±1℃

TEMPERATURE UNIFORMITY : ±5℃

Temperature Control : 50 Segments programmable and auto control

Furnace tube : Quartz tube

Application : PECVD

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1200C Max. Lab PECVD Tube Furnace with Gas Delivery & Vacuum Pump


Intelligent PECVD Introduction:
PECVD system is designed to decrease reaction temperature of traditional CVD. It installed RF induction equipment in front of traditional CVD to ionize reacting gas, so plasma is generated. Plasma's high activity is Reaction is accelerated due to the high activity of plasma. So, this system is called PECVD.
This model is the newest product, it synthesized the advantages of most tube PECVD system, and added pre-heating zone in the front of PECVD system. Tests showed that the deposition speed is quicker, film quality is better, holes is less, and won't crack. AISO fully automatic intelligent control system is independently designed by our company, it is more convenient to operate and its function is more powerful.
Wide application range: metal film, ceramic film, composite film, continuous growth of various films.Easy to increase function, can expand plasma cleaning etch and other functions


Main Feature:

  • High film deposition rate: RF glow technology, greatly increasing the deposition rate of the film, the deposition rate can reach 10Å / S
  • High area uniformity: Advanced multi-point RF feeding technology, special gas path distribution and heating technology, etc., make the film uniformity index reach 8%
  • High consistency: using the advanced design concept of the semiconductor industry, the deviation between the substrates of one deposition is less than 2%
  • High process stability: Highly stable equipment ensures continuous and stable process



Standard Spares:

  • Plugging tube 4 pcs
  • Furnace tube 1 pc
  • Vacuum pump 1 pc
  • Vacuum sealing flange 2 sets
  • Vacuum gauge 1 pc
  • Gas delivery & vacuum pump
  • RF plasma equipment


Optional Spares:

  • Quick release flange, Three-way flange
  • 7 inch HD touch scree




1200℃ PECVD Tube Furnace Standard specification:

1. Heating System
Max.temperature 1200℃ (1 hour)
Working temperature ≤1100℃
Chamber size Φ100*1650mm (Tube diamater is customizable)
Chamber material High purity alumina fiber board
Thermocouple K type
Temperatureaccuracy ±1℃
Temperature control

● 50 programmable segments for precise control of heating rate, cooling rate and dwell time.

● Built in PID Auto-Tune function with overheating & broken thermocouple broken protection.

● PLC automatic control system by PC controller inside.

● The temperature control system, sliding system (Time and Distance) could be controlled by program.
Heating length 440mm
Constant heating length 200mm
Heating element Resistance wire
Power supply Single phase, 220V, 50Hz
Rated power 9kW
2. RF Plasma Source
RF frequency 13.56 MHz±0.005%
Output power 500W
Max reflect power 500W
RF output interface 50 Ω, N-type, female
Power stability ±0.1%
Harmonic component ≤-50dbc
Supply voltage/Frequency Single phase AC220V 50/60HZ
Whole efficiency >=70%
Power factor >=90%
Cooling method Forced air
3. Three precision mass flowmeters control system
External dimension 600x600x650mm
Connector type Swagelok SS joint
Standard range (N2) 0~100sccm, 0~200sccm, or customizable
Accuracy ±1.5%
Linear ±0.5～1.5%
Repeatability ±0.2%
Response time

Gas property: 1～4 Sec;
Electrical property: 10 Sec
Pressure range 0.1～0.5 MPa
Max.pressure 3MPa
Interface Φ6,1/4''
Display 4 digit display
Ambient temperature 5~45 high purity gas
Pressure gauge －0.1～0.15 MPa, 0.01 MPa/unit
Stop valve Φ6
Polish SS tube Φ6
Low vacuum system included


Why Brother's 1200℃ Lab PECVD Tube Furnace?

  • Manufacturer with 10+ years' experience
  • Best quality
  • Customized design
  • Experienced workers
  • Big factory


Customers from more than 30 countries choose us

  • Satisfied customers offer proof of our commitment to excellent design, quality and cost efficiency.


Best service, Fast response

  • Free design for special furnace
  • Free technical support for the lifetime
  • Free sample test


If you're interested in our 1200C Max. Lab PECVD Tube Furnace with Gas Delivery & Vacuum Pumpe, contact us now to get a quote!


Product Tags:

rotating tube furnace

      

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